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10.1117/12.2247848ISTP[Anonymous], 2014, NAN EP4 YOUR THIN FI; Asinovski L., 2008, APPL MAT SCI, V205, P764; BEAGLEHOLE D, 1988, REV SCI INSTRUM, V59, P2557, DOI 10.1063/1.1139897; CONFER DL, 1976, APPL OPTICS, V15, P2568, DOI 10.1364/AO.15.002568; Jin G., 1996, DEV VISUALIZATION TR, V67, P2930; Liu Z, 2010, OPT EXPRESS, V18, P3298, DOI 10.1364/OE.18.003298; MERKT U, 1981, APPL OPTICS, V20, P307, DOI 10.1364/AO.20.000307; Sriuwan S., 2015, MAPAN-J METROL SOC I, V30, P31; Uppalapati S, 2015, APPL SURF SCI, V343, P166, DOI 10.1016/j.apsusc.2015.03.014; Wang L, 2015, SENSOR ACTUAT B-CHEM, V210, P649, DOI 10.1016/j.snb.2014.12.127; Zhan QW, 2002, APPL OPTICS, V41, P4443, DOI 10.1364/AO.41.00444311Conference on Optical Metrology and Inspection for Industrial Applications IV held as part of SPIE/COS Photonics Asia Conference592228610023Proc.SPIE2016imaging ellipsometer; large field of view; PCSA structure; Scheimpflug conditionSESE119912312315A polarizer-compensator- sample-analyzer (PCSA) imaging ellipsometer with large field of view is presented. The sample is imaged on a CCD sensor by a telecentric imaging system and its tilt is monitored by an optical autocollimator. The sample, the telecentric imaging system and the CCD sensor satisfy the Scheimpflug condition. In measurement, the light extinction measurement method and the four quadrants average method are used to improve the accuracy. In experiments, a chromium thin film sample is measured by the imaging ellipsometer and a spectroscopic ellipsometer. The measurement results by two ellipsometers are consistent. The usefulness of the imaging ellipsometer is verified.OPTICAL METROLOGY AND INSPECTION FOR INDUSTRIAL APPLICATIONS IVImaging ellipsometer with large field of view会议论文EnglishGu, Liyuan; Zeng, Aijun; Hu, Shiyu; Yuan, Qiao; Cheng, Weilin; Zhang, Shanhua; Hu, Guohang; He, Hongbo; Huang, Huijie407741002315 WOS:000393153300027
外文题目: Imaging ellipsometer with large field of view
作者: Gu, Liyuan; Zeng, Aijun; Hu, Shiyu; Yuan, Qiao; Cheng, Weilin; Zhang, Shanhua; Hu, Guohang; He, Hongbo; Huang, Huijie
刊名: Proc.SPIE
来源图书: OPTICAL METROLOGY AND INSPECTION FOR INDUSTRIAL APPLICATIONS IV
年: 2016 卷: 10023 文章编号:1002315
会议名称: Conference on Optical Metrology and Inspection for Industrial Applications IV held as part of SPIE/COS Photonics Asia Conference
英文关键词:
imaging ellipsometer; large field of view; PCSA structure; Scheimpflug condition
英文摘要:
文献类型: 会议论文
正文语种: English
收录类别: ISTP  
DOI: 10.1117/12.2247848
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