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10.1117/1.OE.57.2.025101SCIChai YJ, 2016, OPT LETT, V41, P3403, DOI 10.1364/OL.41.003403; Genin FY, 1996, P SOC PHOTO-OPT INS, V2870, P439; Jena S, 2014, APPL OPTICS, V53, P850, DOI 10.1364/AO.53.000850; Oliver JB, 2005, P SOC PHOTO-OPT INS, V5991, P99119, DOI 10.1117/12.638809; Ristau D., 1989, NIST SPEC PUBL, V775, P414; Shao JD, 2016, PROC SPIE, V9983, DOI 10.1117/12.2239780; Stolz CJ, 2013, PROC SPIE, V8885, DOI 10.1117/12.2030476; Stolz CJ, 2012, PROC SPIE, V8530, DOI 10.1117/12.981735; Stolz CJ, 1997, P SOC PHOTO-OPT INS, V2966, P265, DOI 10.1117/12.274272; Stolz CJ, 1999, PROC SPIE, V3738, P347, DOI 10.1117/12.360098; Weakley SC, 1999, P SOC PHOTO-OPT INS, V3578, P137, DOI 10.1117/12.344420; Xing HB, 2015, PROC SPIE, V9532, DOI 10.1117/12.2185981; Zhu MP, 2013, VACUUM, V97, P44, DOI 10.1016/j.vacuum.2013.04.002136813516572Opt. Eng.2018polarizer coating; HfO2-; SiO2 mixture; bandwidth; laser-induced damage thresholdDAMAGE MORPHOLOGY; COATINGS; THICKNESSREORTSOM218a1Two kinds of polarizer coatings were prepared by electron beam evaporation, using HfO2 - SiO2 mixture and HfO2 as the high-refractive-index materials, respectively. The HfO2 - SiO2 mixture layer was implemented by coevaporating SiO2 and metal Hf, the mateStudy on Brewster angle thin film polarizer using hafnia-silica mixture as high-refractive-index material期刊论文EnglishXu, Nuo; Zhu, Meiping; Sun, Jian; Chai, Yingjie; Kui, Yi; Zhao, Yuanan; Shao, Jianda25101 WOS:000427030700030
外文题目: Study on Brewster angle thin film polarizer using hafnia-silica mixture as high-refractive-index material
作者: Xu, Nuo; Zhu, Meiping; Sun, Jian; Chai, Yingjie; Kui, Yi; Zhao, Yuanan; Shao, Jianda
刊名: Opt. Eng.
年: 2018 卷: 57 期: 2 文章编号:25101
英文关键词:
polarizer coating; HfO2-; SiO2 mixture; bandwidth; laser-induced damage threshold
DAMAGE MORPHOLOGY; COATINGS; THICKNESS
英文摘要:
文献类型: 期刊论文
正文语种: English
收录类别: SCI  
DOI: 10.1117/1.OE.57.2.025101
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