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10.1117/12.2297338ISTPBikcora C, 2012, IEEE T SEMICONDUCT M, V25, P384, DOI 10.1109/TSM.2012.2200510; CARLIN BP, 1992, J AM STAT ASSOC, V87, P493, DOI 10.2307/2290282; Cui Yuanting, 2001, P SOC PHOTO-OPT INS, V4346; GORDON NJ, 1993, IEE PROC-F, V140, P107, DOI 10.1049/ip-f-2.1993.0015; Halle S, 2012, PROC SPIE, V8326, DOI 10.1117/12.916312; Ho Grace H., 2001, P SOC PHOTO-OPT INS, V4344; Ing Yet Siew, 2009, P SOC PHOTO-OPT INS, V7520; Mao Yanjie, 2017, P SOC PHOTO-OPT INS; Nakashima T., 2008, P SOC PHOTO-OPT INS, V6924, P69241; Ohmura Y, 2011, PROC SPIE, V7973, DOI 10.1117/12.879616; Ohmura Yasuhiro, 2009, P SOC PHOTO-OPT INS, V7274; Staals F., 2011, P SOC PHOTO-OPT INS, V7973, P79731; Yao CC, 2016, J OPT SOC KOREA, V20, P251, DOI 10.3807/JOSK.2016.20.2.251; Ye Jun, 2013, US, Patent No. [8570485 B2, 8570485]14Conference on Optical Microlithography XXXI701376810587Proc.SPIE2018lithography; lens heating effect; thermal aberration; particle filterSESE151599158715871KIn optical lithography, lens heating induced aberrations of a projection lens lead to degradation of imaging quality. In order to accurately compensate for thermal aberrations by integrated manipulators in projection lens, it is crucial to apply an accurate method for thermal aberration prediction. In this paper, an effective and accurate method for thermal aberration prediction is proposed. Double exponential model is simplified in respect of the timing of exposure tools, and particle filter is used to adjust the parameters of the double exponential model. Parameters of the simplified model are updated recursively pursuant to the aberration data measured during the exchange of wafers. The updated model is used to predict thermal aberrations of the lens during the following exposure of wafer. The performance of the algorithm is evaluated by simulation of a projection lens for ArF lithography. Maximum root mean square (RMS) value of perdition error of thermal aberration under annular illumination and dipolar illumination are reduced by 68.3% and 76.1%, respectively. The proposed method is also of well adaptability to different types of aberration measurement error.OPTICAL MICROLITHOGRAPHY XXXIPrediction of lens heating induced aberration via particle filter in optical lithography会议论文EnglishMao, Yanjie; Li, Sikun; Sun, Gang; Duan, Lifeng; Shi, Weijie; Bu, Yang; Wang, Xiangzhao43607 WOS:000453083800044
外文题目: Prediction of lens heating induced aberration via particle filter in optical lithography
作者: Mao, Yanjie; Li, Sikun; Sun, Gang; Duan, Lifeng; Shi, Weijie; Bu, Yang; Wang, Xiangzhao
刊名: Proc.SPIE
来源图书: OPTICAL MICROLITHOGRAPHY XXXI
年: 2018 卷: 10587
会议名称: Conference on Optical Microlithography XXXI
英文关键词:
lithography; lens heating effect; thermal aberration; particle filter
英文摘要:
文献类型: 会议论文
正文语种: English
收录类别: ISTP  
DOI: 10.1117/12.2297338
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