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CSCDCHANG JC, 2000, J VAC SCI TECHNOL B, V18, P811; Dai EW, 2003, OPT LETT, V28, P1513, DOI 10.1364/OL.28.001513; Doh HH, 2001, JPN J APPL PHYS 1, V40, P3419, DOI 10.1143/JJAP.40.3419; Gogolides E, 2000, J. Appl. Phys., V88, p5570~5584; Jia J, 2004, APPL OPTICS, V43, P2112, DOI 10.1364/AO.43.002112; Jia J, 2003, OPT COMMUN, V228, P271, DOI 10.1016/j.optcom.2003.10.011; Jung ST, 1999, THIN SOLID FILMS, V341, P188, DOI 10.1016/S0040-6090(98)01553-3; KARLSSON M, 2000, APPL OPTICS, V41, P902; Lopez A G, 2001, Appl. Opt, V40, p2068~2075; Mait JN, 2000, OPT LETT, V25, P381, DOI 10.1364/OL.25.000381; Sankur H, 1996, P SOC PHOTO-OPT INS, V2687, P150, DOI 10.1117/12.234628; SHUL RJ, 1997, J VAC SCI TECHNOL A, V15, P1881; Strzelecka EM, 1997, MICROELECTRON ENG, V35, P385, DOI 10.1016/S0167-9317(96)00206-7; Turunen J, 1997, Wyrowski F. Diffractive Optics for Industrial and Commercial Applications; Wu M C, 1997, Proc IEEE, V85, p1833~1856; Xi P, 2002, OPT LETT, V27, P228, DOI 10.1364/OL.27.000228; Zhou C H, 2003, Opt. Lett, V28, p2174~2176; Zhou CH, 2001, P SOC PHOTO-OPT INS, V4470, P138, DOI 10.1117/12.449652; ZHOU CH, 1995, APPL OPTICS, V34, P5961, DOI 10.1364/AO.34.005961196760526411140激光与光电子学进展36感应耦合等离子体(ICP)刻蚀技术是一种新的干法刻蚀技术,具有刻蚀速率高和各向异性刻蚀等优点,并且能够独立控制等离子体密度和自偏置电压.然而,在利用这种技术进行刻蚀的过程中,经常会发生聚合物的沉积,从而阻碍了刻蚀过程的继续.我们报道了在熔融石英表面刻蚀光栅时不产生聚合物沉积的技术,给出了优化参数.所制作的熔融石英普通光栅和600线/mm的高密度光栅的表面很干净,没有聚合物沉积.光栅衍射效率的实际测量值和预期的理论值吻合得很好.最后还研究了ICP技术的刻蚀速度,刻蚀均匀性和过程可重复性等参数.2004inductively coupled plasma; fused silica; gratings; polymer depositionInductively Coupled Plasma technology is a new dry etching technology. It has the merits of high etching rate, anisotropic etching, self-contronable plasma density at low pressure and self-biased voltage. However, in the etching process, polymer deposition that hinders the etching process always takes place. We report an optimized pro-cess for the etching of a surface-relief grating into fused silica without polymer deposition. Both of the fabricated fused silica grating and the high-density grating have very clean surfaces, and no polymer deposition has been found on it Experimental results of the diffraction of the fabricated gratings match well with the theoretical results. Finally, we report the etching rate, uniformity and repeatability of ICP technology for fabrication of microoptical elements.Etching a Surface-Relief Grating into Fused Silica with Inductively Coupled Plasma Technology期刊论文感应耦合等离子体技术用于熔融石英表面凹凸光栅的刻蚀Chinese感应耦合等离子体; 熔融石英; 光栅; 聚合物沉积王顺权; 周常河; 茹华一; 张妍妍 CSCD:1676608
中文题目: 感应耦合等离子体技术用于熔融石英表面凹凸光栅的刻蚀
外文题目: Etching a Surface-Relief Grating into Fused Silica with Inductively Coupled Plasma Technology
作者: 王顺权; 周常河; 茹华一; 张妍妍
刊名: 激光与光电子学进展
年: 2004 卷: 41 期: 11 页: 36--40
中文关键词:
感应耦合等离子体; 熔融石英; 光栅; 聚合物沉积
英文关键词:
inductively coupled plasma; fused silica; gratings; polymer deposition
中文摘要:
英文摘要:
文献类型: 期刊论文
正文语种: Chinese
收录类别: CSCD  
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