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10.1063/1.1144376SCIHENKE BL, 1984, J OPT SOC AM B, V1, P828; HENKE BL, 1984, J OPT SOC AM B, V1, P818; BENJAMIN BF, 1977, APPL OPTICS, V16, P393; FAN PZ, 1992, ACTA OPT SINICA, V12, P118; GONG M, 1992, COMMUNICATION; MAO CS, 1983, NUCLEAR FUSION PLASM, V3, P102; Nishimura H, 1991, J Xray Sci Technol, V3, P14, DOI 10.3233/XST-1991-3102; PASINI D, 1984, APPL OPTICS, V23, P762; TURNER EB, 1965, PLASMA DIAGNOSTIC TE, P345; WANG X, 1992, ACTA OPTICAL SINICA, V12, P353; XU ZZ, 1991, ACTA OPT SINICA, V11, P96111574801864102882Rev. Sci. Instrum.28791993PHOTOGRAPHIC FILMSKRS1991999199364122A simple valid in situ relative intensity calibration technique for soft x-ray film is described. This is based on film exposure measurements of the uniform line-shaped distributed soft x-ray monochromatic irradiation transmitted through a step-wedge absorption filter. Fitting the calibration data with Henke's semiempirical equation for thick-emulsion film, the characteristic curves for Shanghai 5F soft x-ray film without supercoat (SIOM-5FW) have been obtained in the wavelength region from 50 to 80 angstrom.A SIMPLE IN-SITU CALIBRATION TECHNIQUE FOR SOFT-X-RAY FILM期刊论文EnglishLU, PX; FAN, PZ; XU, ZZ; LI, RX; WANG, XF; LI, YL; ZHANG, ZQ; CHEN, SS WOS:A1993MC13700022
外文题目: A SIMPLE IN-SITU CALIBRATION TECHNIQUE FOR SOFT-X-RAY FILM
作者: LU, PX; FAN, PZ; XU, ZZ; LI, RX; WANG, XF; LI, YL; ZHANG, ZQ; CHEN, SS
刊名: Rev. Sci. Instrum.
年: 1993 卷: 64 期: 10 页: 2879--2882
英文关键词:

PHOTOGRAPHIC FILMS
英文摘要:
文献类型: 期刊论文
正文语种: English
收录类别: SCI  
DOI: 10.1063/1.1144376
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