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chi20190524上海光机所杨宝喜557589The development of IC manufacturing industry is changing with each passing day, and its progress cannot be separated from the driving force brought about by the continuous innovation of micro-electronic technology and micro-processing technology. The projection lithography system is currently the mainstream equipment for micronano processing, and its exposure process is one of the most important steps in chip manufacturing. With the continuous improvement of integration level, lithography technology will face more challenges. The independent research and development of the core technology of high-end lithography is of great significance to the improve China's scientific and technological innovation capability and cutting-edge manufacturing industry. The illumination system is a key component of the lithography, its main function is to provide high uniformity illumination, control exposure dose and achieve different illumination modes. The quality of illumination system design directly affects the quality of lithography. This thesis mainly studies the evaluation algorithm and optimization ideas of illumination system from the requirements of lithography in the practical use of illumination pupil and illumination polarization characteristics. The quality of illumination pupil is one of the criteria for judging the quality of the illumination system. A qualified illumination system requires high symmetry of the pupil. However, the existence of aberration in optical system, the inhomogeneity of material, the function of optical film, and the error of component processing and setting will make the symmetry of illumination pupil become worse, which will affect the precision of lithography machine and the uniformity of critical dimension. Therefore, it is necessary to evaluate pupil characteristics in the design and optimization procedure. In this paper, an evaluation algorithm for the pupil characteristic parameters of the illumination system is proposed. Through the reasonable division and conversion calculation of the pupil data, the illumination pupil can be evaluated quickly and accurately. The evaluation and simulation verification for the relay lens of an immersion lithography illumination system which has been designed were carried out. The lithography system generally selects a corresponding polarization illumination mode in combination with off-axis illumination setting according to the specific mask pattern to improve the imaging quality and resolution. The polarization state of the beam is affected by the polarization characteristics of the optical film, the birefringence characteristics of the material, and the processing defects of the component. The resulting polarization aberration reduces imaging contrast and pattern fidelity. Therefore, it is necessary to systematically evaluate the polarization characteristics of various polarization illumination modes to ensure high-quality polarization illumination. In this paper, based on the definition of Stokes vector and polarization requirements of polarized light, an algorithm for evaluating the polarization illumination characteristic parameters of is proposed, which can evaluate the polarization illumination characteristics quickly and accurately. The relay lens were evaluated in different polarization illumination modes, and the effects of film introduction on the polarization illumination characteristic were compared and analyzed. The polarization aberration in optical system will lead to the decrease of pupil quality, which will affect the quality of lithography. The polarization aberration is produced by the change of polarization state in the propagation of polarized light. Using Fresnel principle and Jones matrix theory, the variation of polarization state of polarized light after passing through a lens is analyzed. The relationship between the change of polarization state and the incident angle is drawn in the optical design software, and the influence of material refractive index on the change of polarization state is compared and analyzed.The evaluation of polarization state of light ray is helpful to structure optimization and polarization aberration analysis.2019atalunwen21961321431925Lithography; Illumination system; Pupil characteristic parameters; Polarization illumination; Polarization aberrationResearch on evaluation algorithm of pupil characteristic in lithography illumination system光刻机照明系统光瞳特性评估算法研究集成电路制造业的发展日新月异,其进步离不开微电子技术和微细加工技术不断创新带来的推动作用。投影曝光光刻系统是当前微纳加工的主流设备,其曝光工艺是芯片制造过程当中最为重要的工艺步骤之一。随着集成度的日益提高,光刻技术也迎来了越来越多的挑战,高端光刻机核心技术的自主研发对于提高我国的科学技术创新能力,发展尖端制造业具有重要意义。照明系统作为光刻机的关键组成部分,其主要作用是产生高均匀性照明、调控曝光剂量和提供不同照明模式。照明系统设计的优劣直接影响到投影光刻的质量。本论文主要从光刻机照明系统在实际应用中对照明光瞳和偏振照明的需求出发,对照明系统光瞳特性的评估算法和优化思路展开研究。 照明光瞳质量是评判照明系统好坏的标准之一,合格的照明系统需要照明光瞳具有高对称性。然而光学系统像差的存在、材料不均匀性、光学薄膜的作用、以及元件加工误差和装调误差会使得照明光瞳的对称性变差,将影响光刻机的套刻精度和特征尺寸的均匀性。因此在照明系统设计和优化过程中,对光瞳特性的评估是十分必要的。本文提出了一种照明系统光瞳特性参数评估算法,通过对光瞳数据的合理划分和转换计算,能够快速、准确地对照明光瞳进行评估。对课题组已完成光学设计的一种浸没式扫描光刻机照明系统中继镜组进行了光瞳评估和仿真验证工作。 光刻系统通常根据具体的掩模图形选择相应的偏振照明模式,同时结合离轴照明设置以达到改善成像效果和提升分辨率的目的。光束偏振态会受光学薄膜的偏振特性、材料的双折射特性和元件加工缺陷的影响而发生改变,产生的偏振效应会降低成像对比度和图形保真度。因此在照明系统设计和优化过程中需要对各种偏振照明模式的偏振特性进行系统地评估,保证高质量的偏振照明。本文依据偏振光的Stokes矢量定义和光刻机的偏振照明需求,提出了一种偏振照明特性参数评估算法,能够快速、准确地对偏振照明特性进行较全面的评估。对中继镜组在不同偏振照明模式下进行评估,同时对比分析了膜系的引入对偏振照明特性的影响。 光学系统中存在的偏振像差会导致照明光瞳质量降低,进而影响光刻成像质量。偏振光在传播过程中偏振状态的改变产生偏振像差,采用菲涅尔公式和琼斯矩阵理论,分析了偏振光经过透镜后偏振状态的变化规律。并在光学设计软件中绘制光线经过平行平板后偏振状态的改变与入射角度的关系曲线图,此外还对比分析了材料折射率对光线偏振状态改变的影响。对光线偏振状态的评估有助于结构优化和偏振像差的分析。光刻机;照明系统;光瞳特性参数;偏振照明;偏振像差中国科学院上海光学精密机械研究所甘雨光学工程硕士
中文题目: 光刻机照明系统光瞳特性评估算法研究
外文题目: Research on evaluation algorithm of pupil characteristic in lithography illumination system
作者: 甘雨
导师姓名: 杨宝喜
学位授予机构: 中国科学院上海光学精密机械研究所
答辩时间: 20190524
中文关键词:
光刻机;照明系统;光瞳特性参数;偏振照明;偏振像差
英文关键词:
Lithography; Illumination system; Pupil characteristic parameters; Polarization illumination; Polarization aberration
中文摘要:
英文摘要:
文献类型:学位论文
学位级别: 硕士
正文语种: chi
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